Tsukuba, Japan

Satoyuki Nomura

This inventor holds 20 USPTO granted patents and 6 EPO patents, primarily in Light Control Technology. Top assignees: Hitachi Chemical Company, Ltd., Maxdem Incorporated, Sumation Co., Ltd.. Active years: 2004-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Satoyuki Nomura. Retrieved from https://idiyas.com/inventor/satoyuki-nomura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0


Average Co-Inventor Count = 4.2

ph-index = 6

Forward Citations = 97(Granted Patents)


Location History:

  • Ibaraki, JP (2004 - 2006)
  • Tokyo, JP (2018)
  • Tsukuba, JP (2007 - 2019)

Company Filing History:


Years Active: 2004-2019

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Areas of Expertise:
Light Control Film
Electroluminescent Material
Polishing Agent
Circuit Connection
High-Molecular Copolymer
Wiring-Connecting Material
Organic Electronics
Purification Process
Luminescent Compositions
Manufacturing Method
Storage Solution
Circuit Board Production
20 patents (USPTO):Explore Patents

Title: Innovations of Satoyuki Nomura in Light Control Films

Introduction

Satoyuki Nomura, based in Tsukuba, Japan, is a prominent inventor with a remarkable portfolio that includes 20 patents. His work primarily focuses on innovations in light control films, which have significant applications in various technological fields. Nomura’s expertise and contributions reflect the intersection of materials science and electrical engineering.

Latest Patents

Among his latest patents, one notable invention is a sophisticated light control film that features two transparent electroconductive resin substrates, each equipped with a transparent electroconductive film. Between these substrates lies a specialized light control layer. This invention is distinct because the transparent electroconductive film of one substrate is intentionally cut along a designed cutting line, forming the shape of a picture or character. This cutting technique creates a closed region that electrically insulates the designed shape from the surrounding film, enhancing adhesiveness between the film matrix and substrates, all while ensuring stable light control functionality.

Another innovative patent by Nomura details a light control film that similarly comprises two transparent electroconductive resin substrates, sandwiching a light control layer composed of a resin matrix and a light control suspension. This version features a primer layer made of a thin film with metal oxide fine particles dispersed in an organic binder resin, which significantly improves the bonding between the film matrix and substrates while maintaining effective light control.

Career Highlights

Nomura has made significant strides in the industry, working with leading companies such as Hitachi Chemical Company, Ltd. and Maxdem Incorporated. His tenure in these organizations highlights his impact on the development of advanced materials and technologies, particularly in the realm of electroconductive films.

Collaborations

Throughout his career, Satoyuki Nomura has collaborated with other notable individuals in the field, including Yoshii Morishita and Tooru Tanaka. These professional relationships have contributed to his innovations, helping cultivate a rich environment for creative experimentation and technological advancement.

Conclusion

Satoyuki Nomura's contributions to the field of light control films exemplify his innovative spirit and dedication to advancing technology. His patents not only showcase his technical expertise but also pave the way for future developments in materials that enhance performance across various applications. As he continues to push the boundaries of what's possible, Nomura remains a key figure in the world of invention and innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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