Hikone, Japan

Satoshi Taniguchi

This inventor holds 1 USPTO granted patent. Top assignee: Dainippon Screen Mfg. Co., Ltd.. Active years: 1993.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Satoshi Taniguchi. Retrieved from https://idiyas.com/inventor/satoshi-taniguchi-foubde1k

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1993

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1 patent (USPTO):Explore Patents

Title: Satoshi Taniguchi: Innovator in Scanning Exposure-Reproduction Technology

Introduction

Satoshi Taniguchi is a notable inventor based in Hikone, Japan. He has made significant contributions to the field of scanning exposure-reproduction technology. His innovative work has led to the development of a unique apparatus that enhances reproduction methods.

Latest Patents

Taniguchi holds a patent for a "Scanning exposure-reproduction apparatus and scaling reproduction method." This invention involves a sophisticated process where the input reproduction scale is analyzed to determine practical moving speeds of a holder and a cylindrical drum. The method ensures that the reproduction scale remains consistent with the input values, optimizing the efficiency of the reproduction process.

Career Highlights

Satoshi Taniguchi is associated with Dainippon Screen Mfg. Co., Ltd., a company renowned for its advancements in manufacturing technology. His work at this company has positioned him as a key player in the development of innovative solutions in the industry.

Collaborations

Taniguchi has collaborated with Yasuyuki Oka, contributing to the advancement of their shared projects and enhancing the technological capabilities of their work.

Conclusion

Satoshi Taniguchi's contributions to scanning exposure-reproduction technology exemplify the impact of innovation in manufacturing processes. His patent and career achievements reflect his dedication to advancing technology in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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