Satoshi Ohkubo

Title: Innovations of Satoshi Ohkubo in Semiconductor Manufacturing

Introduction

Satoshi Ohkubo is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 5 patents. His work focuses on developing advanced methods for producing semiconductor devices with improved efficiency and quality.

Latest Patents

Ohkubo's latest patents include a manufacture system for semiconductor devices with a thin gate insulating film. This innovative method involves several key steps: transporting a silicon wafer into a reaction chamber, introducing an oxidizing atmosphere, and raising the temperature of the silicon wafer to an oxidation temperature. The process continues with the introduction of a wet oxidizing atmosphere to form a thermal oxide film on the silicon wafer's surface. Additionally, the method includes purging gas in the reaction chamber using inert gas to lower the residual water concentration. Finally, an NO or NO-containing atmosphere is introduced while maintaining the silicon wafer above 700°C to incorporate nitrogen into the thermal oxide film, resulting in the formation of an oxynitride film. This process allows for the efficient manufacturing of a thin oxynitride film with good mass productivity.

Career Highlights

Satoshi Ohkubo is currently employed at Fujitsu Corporation, where he continues to innovate in semiconductor technology. His expertise and dedication to research have positioned him as a key figure in the industry.

Collaborations

Ohkubo has collaborated with notable coworkers, including Shinji Miyagaki and Takashi Eshita. Their combined efforts contribute to the advancement of semiconductor manufacturing techniques.

Conclusion

Satoshi Ohkubo's contributions to semiconductor manufacturing through his innovative patents and collaborations highlight his importance in the field. His work continues to influence the development of efficient manufacturing processes for semiconductor devices.