Yokkaichi, Japan

Satoshi Nishimura

This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Chemical Corporation. Active years: 1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Satoshi Nishimura. Retrieved from https://idiyas.com/inventor/satoshi-nishimura-07mh8ikm

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: Satoshi Nishimura: Innovator in Ethylene Polymers

Introduction

Satoshi Nishimura is a prominent inventor based in Yokkaichi, Japan. He has made significant contributions to the field of polymer science, particularly in the development of ethylene polymers. His innovative work has led to advancements that enhance the moldability of inflation films.

Latest Patents

Nishimura holds a patent for an ethylene polymer that is particularly useful for molding inflation film. This polymer is characterized by its excellent moldability and is produced through a specific process that meets several defined conditions. His patent is a testament to his expertise and dedication to improving polymer technology.

Career Highlights

Satoshi Nishimura is associated with Mitsubishi Chemical Corporation, where he has been instrumental in research and development. His work has not only contributed to the company's portfolio but has also advanced the industry standards for polymer applications.

Collaborations

Throughout his career, Nishimura has collaborated with notable colleagues, including Nobuaki Sakurai and Masataka Souda. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Satoshi Nishimura's contributions to the field of ethylene polymers exemplify his commitment to innovation and excellence. His work continues to influence the industry and pave the way for future advancements in polymer technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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