Sayama, Japan

Satoshi Nakayama

This inventor holds 3 USPTO granted patents. Top assignees: Nippon Telegraph and Telephone Public Corporation, Nippon Electric Co., Ltd.. Active years: 1980-1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Satoshi Nakayama. Retrieved from https://idiyas.com/inventor/satoshi-nakayama-17fvjdwi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.2

ph-index = 3

Forward Citations = 178(Granted Patents)


Location History:

  • Isehara, JP (1985)
  • Sayama, JP (1980 - 1987)

Company Filing History:


Years Active: 1980-1987

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3 patents (USPTO):Explore Patents

Title: Satoshi Nakayama: Innovator in X-ray Technology and Chemical Vapor Deposition

Introduction

Satoshi Nakayama is a prominent inventor based in Sayama, Japan. He has made significant contributions to the fields of X-ray technology and chemical vapor deposition, holding a total of 3 patents. His innovative work has advanced the efficiency and effectiveness of various technologies.

Latest Patents

One of Nakayama's latest patents is an X-ray source and X-ray lithography method. This invention features a gas injection type plasma X-ray source that includes a gas plenum for storing a discharging gas at pressures ranging from 150 Torr to 1000 Torr. The stored gas is injected between a pair of electrodes through a gas valve, forming a gas jet that produces plasma. A voltage is applied between the electrodes to generate discharge plasma, resulting in the emission of X-rays from the linear plasma. This X-ray source boasts high conversion efficiency, improved stability, and increased X-ray output.

Another notable patent is a chemical vapor deposition apparatus. This apparatus consists of a reactor divided into a reaction space and a purging space, with a susceptor that supports a wafer. The design allows for effective pressure reduction in both the reactor and loading chamber. The susceptor features multiple recesses for wafer handling, and it is heated by a lamp unit positioned outside a transparent wall. This compact apparatus processes one or a small number of wafers at a time, ensuring high reproducibility and a uniform film deposition.

Career Highlights

Throughout his career, Satoshi Nakayama has worked with notable companies, including Nippon Telegraph and Telephone Public Corporation and Nippon Electric Co., Ltd. His experience in these organizations has contributed to his expertise in developing advanced technologies.

Collaborations

Nakayama has collaborated with esteemed colleagues such as Hideo Yoshihara and Hideaki Takeuchi. These partnerships have fostered innovation and the sharing of ideas in the field of technology.

Conclusion

Satoshi Nakayama's contributions to X-ray technology and chemical vapor deposition have made a significant impact in his field. His innovative patents and collaborations highlight his role as a leading inventor in Japan.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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