This inventor holds 4 USPTO granted patents. Top assignee: Dai Nippon Printing Co., Ltd.. Active years: 1995-1999.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Shinjuku, JP (1995)
- Tokyo, JP (1996)
- Sinjuku-Ku, JP (1998)
- Shinjuku-Ku, JP (1999)
Company Filing History:
Years Active: 1995-1999
Title: Innovations by Satoshi Nakamae
Introduction
Satoshi Nakamae is a notable inventor based in Shinjuku, Japan. He has made significant contributions to the field of film and sheet support structures, holding a total of four patents. His innovative designs focus on enhancing the functionality and efficiency of flexible films used in various applications.
Latest Patents
Nakamae's latest patents include a "Support structure for tensely extending and supporting film or sheet." This invention involves a flexible film of synthetic resin arranged on a rigid support plate, with both edges of the film attached to fixing portions of the support plate. The design allows the film to be tensely extended and supported between a frame body and the support plate, creating a gap below the film when fitted into the frame body.
Another significant patent is the "Film stretching structure," which holds a non-self-supporting film taut to prevent creasing or slackening. This structure consists of a quadrangular outer frame and an inner frame, forming gaps that allow stretching members to push the film into place. The simplicity of this construction enables effective support for films and sheets without compromising their integrity.
Career Highlights
Satoshi Nakamae works at Dai Nippon Printing Co., Ltd., where he continues to develop innovative solutions in the field of film and sheet technology. His work has garnered attention for its practical applications and contributions to the industry.
Collaborations
Nakamae collaborates with talented coworkers, including Hitomu Watanabe and Makoto Honda. Their combined expertise fosters a creative environment that drives innovation within their projects.
Conclusion
Satoshi Nakamae's inventive spirit and dedication to improving film and sheet support structures have led to valuable patents that enhance functionality in various applications. His contributions reflect a commitment to innovation and excellence in his field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile