Yokohama, Japan

Satoshi Miki

This inventor holds 1 USPTO granted patent. Top assignee: Anest Iwata Corporation. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Satoshi Miki. Retrieved from https://idiyas.com/inventor/satoshi-miki-6xfccs8z

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Satoshi Miki: Innovator in Exhaust Gas Filtration

Introduction

Satoshi Miki is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of exhaust gas filtration. His innovative approach has led to the development of a unique exhaust gas filter that enhances environmental protection.

Latest Patents

Miki holds a patent for an exhaust gas filter. This invention comprises an outer tube, a plurality of center-closing filter units each having an isolation plate, and a plurality of center-opening filter units featuring an annular isolation plate. The two types of filter units are arranged alternately within the outer tube. The isolation plate and annular isolation plate are enclosed by flammable fibers. When contaminated gas passes through these flammable fibers, it undergoes effective filtration.

Career Highlights

Satoshi Miki is currently employed at Anest Iwata Corporation, where he continues to innovate in the field of filtration technology. His work is instrumental in developing solutions that address environmental challenges.

Collaborations

Miki collaborates with talented individuals such as Takashi Arai and Youhei Midorikawa. Their combined expertise contributes to the advancement of innovative technologies in their field.

Conclusion

Satoshi Miki's contributions to exhaust gas filtration demonstrate his commitment to innovation and environmental sustainability. His work at Anest Iwata Corporation and his patented technology reflect his significant impact in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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