Osaka, Japan

Satoshi Maeda

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Sumitomo Electric Industries, Limited. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Satoshi Maeda. Retrieved from https://idiyas.com/inventor/satoshi-maeda-yc5q1emo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Satoshi Maeda - Innovator at Panasonic Corporation

Introduction

Satoshi Maeda is a notable inventor based in Osaka, Japan. He is currently associated with Panasonic Corporation, where he contributes to innovative developments in technology. Although he has not yet been granted any patents, his work is significant in the field of engineering.

Latest Patent Applications

Satoshi Maeda's latest patent application is for a sliding member. This sliding member contains, in a sliding layer, a synthetic resin, a solid lubricant, and an additive. The synthetic resin can be a polyimide, a polyamide imide, a polybenzimidazole, a polyphenyl sulfone, a polyether sulfone, a polyether ether ketone, or a combination thereof. The solid lubricant may include polytetrafluoroethylene, a tetrafluoroethylene-perfluoroalkoxyethylene copolymer, molybdenum disulfide, or a tetrafluoroethylene-hexafluoropropylene copolymer, among others. The contained amount of the solid lubricant in the sliding layer is specified to be between 5.0-40.0 vol. %. Additionally, the additive can be bentonite, smectite clay mineral, silica, or a polyamide, with a contained amount of 0.1-9.0 vol. % in the sliding layer.

Conclusion

Satoshi Maeda is an innovative inventor at Panasonic Corporation, contributing to advancements in technology through his patent applications. His work, particularly in the development of sliding members, showcases his commitment to engineering excellence.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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