Company Filing History:
Years Active: 2011
Title: Satoshi Maebashi: Innovator in Plasma Processing Technology
Introduction
Satoshi Maebashi is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique plasma processing apparatus that enhances the efficiency and effectiveness of high-frequency applications.
Latest Patents
Satoshi Maebashi holds 1 patent for his invention titled "Plasma processing apparatus." This apparatus features a member for propagating high frequency from a high-frequency power supply. It includes a power feed rod that is electromagnetically shielded between a matching unit and the bottom plate of a chamber. The design incorporates a coaxial cylindrical conductor connected to a ground potential. Additionally, a surface potential system is installed within the cylindrical conductor, which measures the electrostatic surface potential of the power feed rod in a non-contact state. This system provides a controller with a surface potential detection signal, allowing for precise measurement and processing of the DC potential on the power feed rod.
Career Highlights
Satoshi Maebashi is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at this organization has allowed him to further develop his expertise in plasma processing technologies.
Collaborations
Throughout his career, Satoshi has collaborated with esteemed colleagues such as Toshihiro Hayami and Naoyuki Umehara. These collaborations have contributed to advancements in their respective fields and have fostered innovation within the industry.
Conclusion
Satoshi Maebashi is a distinguished inventor whose work in plasma processing technology has made a significant impact. His patent for the plasma processing apparatus showcases his innovative approach to solving complex engineering challenges. His contributions continue to influence the field and inspire future advancements.