Location History:
- Ibaraki, JP (1991 - 1994)
- Tsuchiura, JP (1994)
Company Filing History:
4 out of 1,430 
3 out of 805 
1 out of 1 Years Active: 1991-1994
Title: Satoshi Kushiyama: Innovator in Plasma Technology
Introduction
Satoshi Kushiyama is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of plasma technology, particularly in the decomposition of halogenated organic compounds. With a total of 4 patents, his work has implications for environmental science and industrial applications.
Latest Patents
Kushiyama's latest patents include an "Apparatus for decomposing halogenated organic compound." This invention introduces halogenated organic compounds into a high-temperature plasma exceeding 10,000°C, where the reactive environment allows for the rapid decomposition of these compounds. Additionally, he has developed a "Gas adsorption and desorption method," which involves contacting a mixed gas with a non-carbonaceous adsorbent while irradiating it with electromagnetic waves. This method selectively adsorbs gas components with smaller coefficients of dielectric loss, enhancing the efficiency of gas separation processes.
Career Highlights
Throughout his career, Satoshi Kushiyama has worked with prominent organizations such as the Agency of Industrial Science and Technology and Jeol Ltd. His experience in these institutions has allowed him to refine his expertise in plasma technology and gas adsorption methods.
Collaborations
Kushiyama has collaborated with notable colleagues, including Koichi Mizuno and Reiji Aizawa. These partnerships have contributed to the advancement of his research and the successful development of his patents.
Conclusion
Satoshi Kushiyama's innovative work in plasma technology and gas adsorption methods showcases his commitment to advancing scientific knowledge and practical applications. His contributions are vital for addressing environmental challenges and improving industrial processes.