Company Filing History:
Years Active: 2009-2010
Title: Satoshi Iwamoto: Innovator in Semiconductor Technology
Introduction
Satoshi Iwamoto is a notable inventor based in Toyama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on enhancing the efficiency and functionality of semiconductor devices.
Latest Patents
Iwamoto's latest patents include innovative designs for semiconductor devices. One of his patents describes a semiconductor device that features a memory section formed at a semiconductor substrate. This section includes a first transistor with an ONO film capable of storing charges between the semiconductor substrate and a memory electrode. Additionally, it has a first STI region for isolating the first transistor. The CMOS section of the device includes a second transistor with a CMOS electrode and a gate dielectric, along with a second STI region for isolating the second transistor. Notably, the height of the top surface of the first STI region is set equal to or smaller than that of the second STI region.
Another patent by Iwamoto also focuses on a semiconductor device with similar features, emphasizing the importance of the memory section and the CMOS section in enhancing device performance.
Career Highlights
Satoshi Iwamoto is currently employed at Panasonic Corporation, where he continues to innovate in the semiconductor field. His work has been instrumental in advancing the technology used in various electronic devices.
Collaborations
Iwamoto has collaborated with notable colleagues, including Nobuyoshi Takahashi and Fumihiko Noro. Their combined expertise contributes to the development of cutting-edge semiconductor technologies.
Conclusion
Satoshi Iwamoto's contributions to semiconductor technology through his patents and work at Panasonic Corporation highlight his role as a key innovator in the field. His advancements continue to influence the development of efficient electronic devices.