Funabashi, Japan

Satoshi Inoue

This inventor holds 1 USPTO granted patent. Top assignee: Dainippon Ink and Chemicals, Incorporated. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Satoshi Inoue. Retrieved from https://idiyas.com/inventor/satoshi-inoue-8uckci0f

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Satoshi Inoue: Innovator in Polyarylene Sulfide Preparation

Introduction

Satoshi Inoue is a notable inventor based in Funabashi, Japan. He has made significant contributions to the field of materials science, particularly in the preparation of polyarylene sulfide. His work has implications for various industrial applications, showcasing his innovative spirit and technical expertise.

Latest Patents

Satoshi Inoue holds a patent for a "Process for the preparation of polyarylene sulfide." This patent highlights his ability to develop advanced methods for creating this important polymer, which is known for its high thermal stability and chemical resistance.

Career Highlights

Inoue is currently employed at Dainippon Ink and Chemicals, Incorporated, where he continues to push the boundaries of material innovation. His work at this esteemed company has allowed him to collaborate with other talented professionals in the field.

Collaborations

One of his notable coworkers is Osamu Komiyama. Together, they have worked on various projects that enhance the capabilities and applications of polyarylene sulfide.

Conclusion

Satoshi Inoue's contributions to the field of materials science, particularly through his patent on polyarylene sulfide preparation, demonstrate his innovative approach and dedication to advancing technology. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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