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For the Inventor, By the Inventor

Tokyo, Japan

Satoshi Habu

This inventor holds 4 USPTO granted patents. Top assignee: Hewlett-Packard Company. Active years: 1995-1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Satoshi Habu. Retrieved from https://idiyas.com/inventor/satoshi-habu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 4

% Patents Active = 100.0

Average Co-Inventor Count = 1.3

ph-index = 4

Forward Citations = 258(Granted Patents)


Location History:

  • Hachiojishi, JP (1995)
  • Hachioji, JP (1996)
  • Tokyo, JP (1997 - 1999)

Company Filing History:

goldMedal4 out of 9,639 
 
Hewlett-Packard Company
 patents

Years Active: 1995-1999

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4 patents (USPTO):Explore Patents
1. 5903143 - Probe apparatus with RC circuit connected between ground and a guard (1999-05-11),
2. 5680039 - Probe apparatus for use in both high and low frequency measurements (1997-10-21),
3. 5493070 - Measuring cable and measuring system (1996-02-20),
4. 5406217 - Method of measuring the current-voltage characteristics of a DUT (1995-04-11),

Title: Satoshi Habu: Innovator in Precision Measurement Technology

Introduction

Satoshi Habu is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of precision measurement technology, holding a total of 4 patents. His work primarily focuses on developing innovative probe apparatuses that enhance measurement accuracy for both low-frequency and high-frequency applications.

Latest Patents

Habu's latest patents include a "Probe apparatus with RC circuit connected between ground and a guard." This invention is designed to be an inexpensive probe apparatus that operates with high precision, suitable for both low-frequency and high-frequency measurements. The apparatus features a line with a first and second conductor extending from a probe connected to a circuit component. A low-frequency or high-frequency device can be alternately connected to this line. Additionally, a third common conductor runs parallel to the aforementioned line, with a resistor and capacitor connected between the probe end of the second conductor and the common conductor. Another notable patent is the "Probe apparatus for use in both high and low frequency measurements," which shares similar features and benefits, emphasizing Habu's commitment to advancing measurement technology.

Career Highlights

Satoshi Habu is currently employed at Hewlett-Packard Company, where he continues to innovate and develop new technologies. His work has been instrumental in enhancing the capabilities of measurement devices, making them more accessible and efficient for various applications.

Collaborations

Habu collaborates with Kohei Mochizuki, a fellow innovator in the field. Together, they work on projects that push the boundaries of measurement technology and contribute to advancements in the industry.

Conclusion

Satoshi Habu's contributions to precision measurement technology through his innovative patents have established him as a key figure in the field. His work at Hewlett-Packard Company and collaborations with other inventors continue to drive progress in measurement solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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