Tokyo, Japan

Satoshi Fuyuno

This inventor holds 2 USPTO granted patents. Top assignee: Oki Data Corporation. Active years: 2018-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Satoshi Fuyuno. Retrieved from https://idiyas.com/inventor/satoshi-fuyuno

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 1.5

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2018-2019

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2 patents (USPTO):Explore Patents

Title: Satoshi Fuyuno: Innovator in Exposure Devices

Introduction

Satoshi Fuyuno is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of exposure devices and image formation apparatuses. With a total of 2 patents, Fuyuno's work showcases his innovative approach to technology.

Latest Patents

Fuyuno's latest patents include an exposure device and an image formation apparatus featuring a cut fringe holding member. The first patent describes an exposure device that consists of a substrate with mounted light-emitting elements and an optical system that converges light emitted from these elements. The holding member in this device supports both the substrate and the optical system, incorporating a cut fringe that enhances its functionality. The support member is strategically placed between the substrate and the optical system, ensuring optimal performance.

The second patent focuses on an exposure device that includes a board with arranged light-emitting elements and an optical system positioned opposite the board. This device also features a support member that stabilizes both the board and the optical system. Additionally, a cured body is included on the support member, which has a contact surface that interacts with the board, further improving the device's efficiency.

Career Highlights

Satoshi Fuyuno is currently employed at Oki Data Corporation, where he continues to develop innovative technologies. His work has been instrumental in advancing the capabilities of exposure devices, making them more efficient and effective in various applications.

Collaborations

Fuyuno has collaborated with notable colleagues, including Manabu Imai and Susumu Chihara. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Satoshi Fuyuno's contributions to the field of exposure devices highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving image formation apparatuses, making a lasting impact in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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