This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Asahi Kasei Fibers Corporation. Active years: 2019.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2019
Title: Satoru Tezuka: Innovator in Filter Material Technology
Introduction
Satoru Tezuka is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of filter materials, particularly through his innovative patent that enhances the efficiency and longevity of filters. His work is recognized for its practical applications in various industries.
Latest Patents
Satoru Tezuka holds a patent for a filter material that improves particle holding capacity while maintaining high particle capture efficiency. This invention ensures a prolonged filter life, making it a valuable advancement in filtration technology. The patent describes a filter material comprising a spun lace nonwoven fabric that includes a thermoplastic synthetic filament nonwoven fabric as the intermediate layer. This innovative design addresses common challenges faced in filtration processes.
Career Highlights
Throughout his career, Satoru Tezuka has worked with prominent companies, including Asahi Kasei Fibers Corporation and Asahi Kasei Kabushiki Kaisha. His experience in these organizations has allowed him to develop and refine his expertise in materials science and engineering.
Collaborations
Satoru has collaborated with talented individuals in his field, including Hideaki Fujii and Yoshiyuki Tadokoro. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.
Conclusion
Satoru Tezuka's contributions to filter material technology exemplify the impact of innovative thinking in engineering. His patent not only enhances filter performance but also extends the life of filtration systems, showcasing the importance of continuous improvement in industrial applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
