Satoru Sagoh

Title: Satoru Sagoh: Innovator in Electron Beam Technology

Introduction

Satoru Sagoh is a prominent inventor based in Kasugai, Japan. He has made significant contributions to the field of electron beam technology, holding a total of 4 patents. His work focuses on advancements in exposure masks and methods for manufacturing them.

Latest Patents

Satoru Sagoh's latest patents include innovative designs for electron beam exposure masks. One of his notable inventions involves a mask that features a plurality of opening regions arranged via crossbeams. These regions are strategically placed along the peripheral edges of island-like and peninsula-like patterns to effectively shield the transmission of charged particles. Another significant patent describes a device that exposes an object to an electron beam using a mask made from a material that blocks the electron beam. This mask contains multiple pattern exposure blocks, each with one or more aperture-defining regions. These apertures are designed to control the current level of the electron beam while minimizing Coulomb interaction.

Career Highlights

Satoru Sagoh is currently employed at Fujitsu Corporation, where he continues to develop cutting-edge technologies in electron beam applications. His expertise in this area has positioned him as a key player in the advancement of semiconductor manufacturing processes.

Collaborations

Throughout his career, Satoru has collaborated with notable colleagues, including Satoru Yamazaki and Kiichi Sakamoto. These partnerships have fostered innovation and contributed to the success of various projects within the field.

Conclusion

Satoru Sagoh's contributions to electron beam technology and his innovative patents highlight his role as a leading inventor in this specialized field. His work continues to influence advancements in manufacturing processes and technology.