Nobeoka, Japan

Satoru Ohtsuki

This inventor holds 1 USPTO granted patent. Top assignee: Asahi Kasei Kogyo Kabushiki Kaisha. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Satoru Ohtsuki. Retrieved from https://idiyas.com/inventor/satoru-ohtsuki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2002

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Satoru Ohtsuki: Innovator in Polymer Stabilization

Introduction

Satoru Ohtsuki is a notable inventor based in Nobeoka, Japan. He has made significant contributions to the field of polymer science, particularly in the stabilization of oxymethylene copolymers. His work has implications for various applications in materials science and engineering.

Latest Patents

Ohtsuki holds a patent for a "Process for stabilizing oxymethylene copolymer." This innovation showcases his expertise in enhancing the properties of polymers, making them more reliable for industrial use. He has 1 patent to his name, reflecting his focused contributions to the field.

Career Highlights

Satoru Ohtsuki is currently employed at Asahi Kasei Kogyo Kabushiki Kaisha, a leading company in the chemical industry. His role at the company allows him to apply his innovative ideas and collaborate with other experts in the field.

Collaborations

Throughout his career, Ohtsuki has worked alongside talented colleagues such as Tadashi Tanaka and Hajime Nagahara. These collaborations have likely enriched his research and contributed to the success of his projects.

Conclusion

Satoru Ohtsuki is a distinguished inventor whose work in polymer stabilization has made a significant impact in the industry. His dedication to innovation continues to inspire advancements in materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…