This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 834,601 Years Active: 2004
Title: Satoru Ogasawara: Innovator in Gas Cluster Formation
Introduction
Satoru Ogasawara is a notable inventor based in Gifu, Japan. He has made significant contributions to the field of material science, particularly in the area of gas cluster formation. His innovative work has led to the development of methods that are essential for various applications in thin film technology.
Latest Patents
Satoru Ogasawara holds a patent for a "Method for forming gas cluster and method for forming thin film." This patent showcases his expertise in creating advanced materials through innovative techniques. The patent is a testament to his commitment to pushing the boundaries of technology.
Career Highlights
Throughout his career, Ogasawara has demonstrated a strong dedication to research and development. His work has not only advanced scientific understanding but has also paved the way for practical applications in various industries. His innovative spirit continues to inspire those around him.
Collaborations
Satoru Ogasawara has collaborated with talented individuals such as Makoto Akizuki and Mitsuaki Harada. These partnerships have fostered a creative environment that encourages the exchange of ideas and the pursuit of groundbreaking innovations.
Conclusion
Satoru Ogasawara is a distinguished inventor whose work in gas cluster formation and thin film technology has made a lasting impact. His contributions to the field exemplify the importance of innovation in advancing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile