Aichi, Japan

Satoru Kosaka

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Denso Corporation. Active years: 1999.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1999

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Satoru Kosaka: Innovator in Etching Technology

Introduction

Satoru Kosaka is a notable inventor based in Aichi, Japan. He has made significant contributions to the field of etching technology, particularly in the development of methods that enhance the quality of silicon etching processes.

Latest Patents

Satoru Kosaka holds a patent for an innovative etchant, etching method using the same, and related etching apparatus. This patent focuses on a silicon substance that is etched using an alkaline etchant containing additives such as copper, lead, and magnesium. The intentional control of the additive content allows for the achievement of desired etching quality during the etching operation.

Career Highlights

Satoru Kosaka is currently employed at Denso Corporation, a leading company in the automotive industry. His work at Denso has allowed him to apply his expertise in etching technology to practical applications within the company.

Collaborations

Throughout his career, Satoru has collaborated with talented individuals such as Motoki Ito and Hiroshi Tanaka. These collaborations have contributed to the advancement of etching technologies and have fostered innovation within the field.

Conclusion

Satoru Kosaka's contributions to etching technology demonstrate his commitment to innovation and excellence. His patent and work at Denso Corporation highlight the importance of advancements in this area, paving the way for future developments in silicon etching processes.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…