Matsutou, Japan

Satoru Kitamura

This inventor holds 1 USPTO granted patent. Top assignees: Kabushiki Kaisha Ishikawa Seisakusho, Ltd., Mitsubishi Rayon Company, Limited. Active years: 1991.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Satoru Kitamura. Retrieved from https://idiyas.com/inventor/satoru-kitamura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 1991

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1 patent (USPTO):Explore Patents

Title: Satoru Kitamura: Innovator in Optical Weft Detection Technology

Introduction

Satoru Kitamura is a notable inventor based in Matsutou, Japan. He has made significant contributions to the field of textile technology, particularly in the development of optical weft detecting devices. His innovative approach has led to advancements that enhance the efficiency of air jet looms.

Latest Patents

Satoru Kitamura holds 1 patent for his invention titled "Reed Dent with Optical Weft Detecting Device." This device integrates optical fiber bundles, lenses, a light emitting module, a light receiving module, and an amplifier into a thin detecting sensor body. The design allows the device to fit into the narrow space between the reed dents of an air jet loom, improving the detection of weft threads.

Career Highlights

Throughout his career, Satoru Kitamura has worked with prominent companies in the textile industry. He has been associated with Kabushiki Kaisha Ishikawa Seisakusho, Ltd. and Mitsubishi Rayon Company, Limited. His work in these organizations has contributed to the advancement of textile manufacturing technologies.

Collaborations

Satoru Kitamura has collaborated with notable colleagues, including Shigehira Minami and Yoshihiko Habu. These partnerships have fostered innovation and development in their respective fields.

Conclusion

Satoru Kitamura's contributions to optical weft detection technology exemplify his innovative spirit and dedication to improving textile manufacturing processes. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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