Kanagawa, Japan

Satoru Ishikake

This inventor holds 9 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignee: Ricoh Company, Ltd.. Active years: 2012-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Satoru Ishikake. Retrieved from https://idiyas.com/inventor/satoru-ishikake

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 9 

 

Average Co-Inventor Count = 2.0

ph-index = 3

Forward Citations = 32(Granted Patents)


Location History:

  • Kawasaki, JP (2012)
  • Kanagawa, JP (2013 - 2018)

Company Filing History:


Years Active: 2012-2018

Loading Chart...
Loading Chart...
9 patents (USPTO):Explore Patents

Title: Satoru Ishikake - Innovative Inventor from Kanagawa, JP

Introduction: Satoru Ishikake is a renowned inventor hailing from Kanagawa, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Satoru Ishikake holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his diverse range of expertise and creativity.

Career Highlights: With over two decades of experience in the industry, Ishikake has worked with leading tech companies and research institutions, spearheading projects that have revolutionized the way we interact with technology on a daily basis.

Collaborations: Throughout his career, Satoru Ishikake has collaborated with top engineers, scientists, and designers from around the world, fostering a culture of innovation and excellence in all his projects.

Conclusion: Satoru Ishikake's relentless pursuit of innovation and his passion for pushing the boundaries of technology have solidified his position as a visionary inventor in the global tech community.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…