Osaka, Japan

Satoru Hishikawa

USPTO Granted Patents = 2 


 

Average Co-Inventor Count = 3.4

ph-index = 1


Company Filing History:


Years Active: 2020-2022

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2 patents (USPTO):Explore Patents

Title: Satoru Hishikawa: Innovator in Polyurethane and Epoxy Resin Technologies

Introduction

Satoru Hishikawa is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of materials science, particularly in the development of polyurethane and epoxy resin compositions. With a total of 2 patents, Hishikawa's work focuses on creating innovative solutions for outdoor applications.

Latest Patents

Hishikawa's latest patents include a "Curable polyurethane composition for the preparation of outdoor articles, and the articles obtained therefrom." This curable composition comprises a mixture of homopolymers of an aliphatic polyisocyanate and a cycloaliphatic polyisocyanate, along with a polyester polyol or polyether polyol and a filler. This composition is particularly suitable for the manufacture of outdoor insulation system articles. His second patent is a "Thermosetting resin composition for the preparation of outdoor articles and the articles obtained therefrom," which involves a multiple component thermosetting epoxy resin composition.

Career Highlights

Throughout his career, Hishikawa has worked with prominent companies in the materials industry. Notably, he has been associated with Huntsman Advanced Materials (Switzerland) GmbH and Huntsman International LLC. His work in these organizations has allowed him to develop and refine his innovative ideas in polymer chemistry.

Collaborations

Hishikawa has collaborated with several professionals in his field, including Christian Beisele and Hongyan Chen. These collaborations have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Satoru Hishikawa is a distinguished inventor whose work in polyurethane and epoxy resin technologies has made a significant impact on outdoor applications. His innovative patents and collaborations highlight his commitment to advancing materials science.

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