Satoru Funato

Title: The Innovative Contributions of Satoru Funato in Patented Technologies

Introduction

Satoru Funato, an accomplished inventor based in Saitama, Japan, has made significant strides in the field of materials science and technology. With a portfolio of five patents, he exemplifies the innovative spirit that drives advancements in various industrial applications.

Latest Patents

Satoru Funato's latest patents focus on radiation-sensitive compositions and recording mediums that utilize novel polymer technologies. Notably, his patents include:

1. A radiation-sensitive composition and recording medium featuring acid-labile group protected hydroxystyrene polymers or copolymers.

2. Novel acid-labile group protected hydroxystyrene polymers, which contain recurrent pendant groups such as 1-(2-methanecarbonyl oxyethoxy) ethoxy group and 1-(2-N-methylcarbamatoethoxy) ethoxy group.

These resist materials contain a polymer, a photo acid generator, a base, additives, and a solvent, demonstrating sensitivity to UV light, electron beams, and X-rays. The process involves acid generation in the irradiated areas, which catalytically deprotects the acid-labile group during post-exposure baking, ultimately allowing for the formation of positive patterns after development with an alkaline solution.

Career Highlights

Satoru Funato has worked with esteemed companies in the industry, including Hoechst Japan Limited and Clariant AG. His role in these companies has contributed significantly to his expertise in developing advanced materials and technologies, particularly those involving polymer science.

Collaborations

Throughout his career, Satoru has collaborated with notable professionals in the field, including Munirathna Padmanaban and Georg Pawlowski. These partnerships have enabled him to leverage diverse insights and expertise, enriching the innovation process in his projects.

Conclusion

Satoru Funato stands out as an influential figure in the realm of innovation, with his five patents revealing a strong commitment to advancing technologies related to radiation-sensitive materials. His contributions not only reflect his dedication to his craft but also highlight the importance of collaboration in the pursuit of groundbreaking advancements.