Suwon-si, South Korea

Satoko Ishibe

This inventor holds 3 USPTO granted patents. Top assignees: Samsung Display Co., Ltd., Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Satoko Ishibe. Retrieved from https://idiyas.com/inventor/satoko-ishibe-mt87p4u0

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 9.5


Company Filing History:


Years Active: 2026

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Satoko Ishibe

Introduction

Satoko Ishibe is a prominent inventor based in Suwon-si, South Korea. She has made significant contributions to the field of light-emitting devices and organometallic compounds. With a total of 3 patents to her name, her work continues to influence advancements in technology.

Latest Patents

Ishibe's latest patents include a film and light-emitting device that incorporates a coordination compound. This film features a novel structure where a ligand containing an electron donor atom is coordinated to a boron atom within a heterocyclic compound. Additionally, she has developed an organometallic compound represented by a specific formula, which is utilized in organic light-emitting devices and diagnostic compositions.

Career Highlights

Throughout her career, Satoko Ishibe has worked with leading companies such as Samsung Display Co., Ltd. and Samsung Electronics Ltd. Her experience in these organizations has allowed her to refine her skills and contribute to groundbreaking innovations in her field.

Collaborations

Ishibe has collaborated with notable colleagues, including Joonghyuk Kim and Sangyeon Hwang. These partnerships have fostered a creative environment that has led to the development of her innovative patents.

Conclusion

Satoko Ishibe's work exemplifies the spirit of innovation in the field of light-emitting devices and organometallic compounds. Her contributions continue to pave the way for future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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