Tokyo, Japan

Satoh Takuji

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Kogaku Kikai Kabushiki. Active years: 1989.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Satoh Takuji. Retrieved from https://idiyas.com/inventor/satoh-takuji

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1989

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1 patent (USPTO):Explore Patents

Title: The Innovations of Satoh Takuji

Introduction

Satoh Takuji is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of holographic interferometry. His work focuses on the analysis of interference fringes, which is crucial for measuring the shape of objects using computer-generated holograms.

Latest Patents

Satoh Takuji holds a patent for a "Method of and apparatus for analyzing interference fringes." This innovative method is designed for use in holographic interferometry processes. It allows for precise measurements of object shapes, enhancing the accuracy of various applications in engineering and science.

Career Highlights

Takuji is associated with Tokyo Kogaku Kikai, a company that specializes in advanced optical technologies. His work has been instrumental in developing methods that improve measurement techniques in various industries. With a focus on practical applications, he has contributed to the advancement of optical measurement systems.

Collaborations

Throughout his career, Takuji has collaborated with esteemed colleagues such as Takashi Yokokura and Takashi Gemma. These partnerships have fostered innovation and have led to the development of new technologies in the field of holography.

Conclusion

Satoh Takuji's contributions to the field of holographic interferometry exemplify the importance of innovation in technology. His patent and collaborative efforts continue to influence advancements in optical measurement techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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