Telangana, India

Satish Kumar Sharaf

USPTO Granted Patents = 2 

Average Co-Inventor Count = 1.3

ph-index = 1


Location History:

  • Telangana, IN (2018)
  • Telanganda, IN (2023)

Company Filing History:


Years Active: 2018-2023

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2 patents (USPTO):Explore Patents

Title: Innovations by Satish Kumar Sharaf

Introduction

Satish Kumar Sharaf is an accomplished inventor based in Telangana, India. He has made significant contributions to the field of technology, particularly in the area of electronic communication and secure user input methods. With two patents to his name, Sharaf continues to push the boundaries of innovation.

Latest Patents

Sharaf's latest patents include "Tracking and securing electronic messages using an embedded identifier" and "Secure user input mode for electronic devices using randomized mathematical operators and operands." The first patent focuses on an authentication server that can receive electronic messages with embedded sender identification. This system ensures that the sender is authorized to transmit the message data, enhancing the security of electronic communications. The second patent introduces a method for performing operations on electronic devices that establishes a relationship between mathematical operators and user movements. This innovative approach allows for secure user access to protected operations by combining user-selected numbers with randomized mathematical operators.

Career Highlights

Sharaf is currently employed at CA, Inc., where he applies his expertise in technology and innovation. His work has garnered attention for its practical applications in enhancing security and user experience in electronic devices.

Collaborations

Sharaf collaborates with fellow innovator Krishna Chaithanya Kasibhatla, contributing to a dynamic environment of creativity and technological advancement.

Conclusion

Satish Kumar Sharaf's contributions to the field of technology through his patents demonstrate his commitment to innovation and security in electronic communications. His work continues to inspire advancements in the industry.

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