This inventor holds 1 USPTO granted patent. Top assignee: Allied Corporation. Active years: 1988.
Company Filing History:
Years Active: 1988
Title: Innovations of Satish K Gupta in Integrated Circuit Technology
Introduction
Satish K Gupta is a notable inventor based in Amherst, NY (US). He has made significant contributions to the field of integrated circuit technology, particularly through his innovative patent related to dielectric films.
Latest Patents
One of his key patents is titled "Cyclosilazane polymers as dielectric films in integrated circuit." This patent presents an improved method for the deposition of dielectric films in the fabrication of integrated circuits (ICs). The method employs a solution of polymers derived from cyclosilazanes to deposit dielectric films on semiconductor substrates using the spin-on technique. These spin-on films effectively planarize the underlying substrate topography, making them especially advantageous in multilevel metallization processes. This innovation allows for a highly uniform and continuous deposition of subsequent metallization layers, resulting in improved yield and reliability of ICs.
Career Highlights
Satish K Gupta is associated with Allied Corporation, where he continues to advance his research and development efforts in semiconductor technology. His work has been instrumental in enhancing the performance and reliability of integrated circuits.
Collaborations
Throughout his career, Gupta has collaborated with notable colleagues, including Louis G Anello and Stephen W Kirtley. These collaborations have contributed to the successful development and implementation of innovative technologies in the field.
Conclusion
Satish K Gupta's contributions to integrated circuit technology through his patent on cyclosilazane polymers have paved the way for advancements in semiconductor fabrication. His work exemplifies the importance of innovation in enhancing the reliability and efficiency of electronic devices.