Munich, Georgia

Sascha Licht


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Sascha Licht

Introduction

Sascha Licht, an accomplished inventor hailing from Moenchengosserstaedt, Germany, has made significant contributions to the field of optical devices. His work in microlithography, a key technology widely used in semiconductor manufacturing, highlights his innovative spirit and technical expertise.

Latest Patents

Licht is credited with a patent for a "Connecting arrangement for an optical device." This invention details a unique connecting arrangement that features a first body and a second body, established in a laminar contact region. The connecting device, affixed to the second body, engages the first body through at least one contact unit, generating a predefinable contact force. Notably, the contact unit comprises multiple separate contact elements that utilize spring units for elastic deformation, thereby contributing to the overall contact force. This innovative approach enhances performance and reliability in optical devices.

Career Highlights

Sascha Licht is currently associated with Carl Zeiss SMT GmbH, a leading company known for its expertise in optics and optoelectronics. His role within the organization underscores his commitment to advancing optical technology, and his single patent is a testament to his inventiveness and dedication to the field.

Collaborations

Throughout his career, Licht has worked alongside esteemed colleagues, including Heiko Methe and Willi Heintel. Their collaborations signify a team effort in tackling complex problems and pushing the boundaries of optical technology. Together, they contribute to the innovative ecosystem within Carl Zeiss SMT GmbH.

Conclusion

Sascha Licht's contributions to the field of optical devices exemplify the impact of innovation in technology. With a strong foundation in research and development, his work not only serves the current demands of the industry but also lays the groundwork for future advancements in microlithography and beyond.

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