This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 1989.
Company Filing History:
Years Active: 1989
Title: Saryadevara Basavaiah: Innovator in Photolithographic Technology
Introduction
Saryadevara Basavaiah is a notable inventor based in Mahopac, NY (US). He has made significant contributions to the field of photolithographic construction of electric circuits. His innovative work has led to the development of a unique patent that enhances the efficiency of electronic circuit manufacturing.
Latest Patents
Saryadevara Basavaiah holds a patent for a "Coated mask for photolithographic construction of electric circuits." This invention involves a mask designed for the deposition of electrically-conductive paste material on a ceramic base. The mask is formed of molybdenum with a titanium nitride coating, which allows for precise application of materials in the construction of electric circuits that incorporate multiple electronic chips. The coating is uniformly applied through a sputtering procedure, ensuring high-quality results in electronic manufacturing.
Career Highlights
Basavaiah is associated with the International Business Machines Corporation (IBM), where he has contributed to various projects and innovations. His work at IBM has positioned him as a key player in advancing technologies related to electronic circuits and photolithography.
Collaborations
Throughout his career, Saryadevara Basavaiah has collaborated with esteemed colleagues, including Kie Y Ahn and Stephen Bruce Brodsky. These collaborations have fostered an environment of innovation and have led to the successful development of advanced technologies in the field.
Conclusion
Saryadevara Basavaiah's contributions to the field of photolithography and electric circuit construction exemplify the spirit of innovation. His patent and work at IBM highlight the importance of advancements in technology that drive the electronics industry forward.