Bristol, United Kingdom

Sarwat Amreen Baig

This inventor holds 2 USPTO granted patents. Top assignee: Hewlett-Packard Development Company, L.p.. Active years: 2016-2018.


% Patents Active = 50.0

Average Co-Inventor Count = 5.1

ph-index = 1


Company Filing History:


Years Active: 2016-2018

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Sarwat Amreen Baig

Introduction

Sarwat Amreen Baig is a notable inventor based in Bristol, GB. He has made significant contributions to the field of technology, particularly in the development of advanced reflective materials. With a total of 2 patents to his name, Baig's work showcases his innovative approach to solving complex problems in material science.

Latest Patents

Baig's latest patents include groundbreaking technologies that enhance the functionality of reflective materials. One of his patents, titled "Diffuse Reflectors," describes a process for fabricating a diffuse reflector. This process involves mixing a fluid that is immiscible in a solution containing mesogens to create a mixture with droplets suspended within it. The mixture is then deposited on a surface and processed to form a film, where the fluid droplets disrupt the alignment of the reactive mesogens, leading to the formation of defects that propagate through the film. This innovative approach allows for the creation of a diffuse reflector that includes a first layer of cholesteric material, reflecting specific wavelengths of light while incorporating fluid droplets to nucleate defects and separate domains.

Another patent, "Reflective Structure with Transparent and Semi-Transparent Transmission Regions," outlines a reflective structure that features both transparent and semi-transparent regions. This structure consists of a first transparent layer with a textured area, a reflective layer beneath it that conforms to the textured area, and a second transparent layer with a refractive index matching that of the first layer. The design allows for the transmission of light with minimal deviation in the transparent regions, while the semi-transparent regions transmit light with significant deviation, enhancing the versatility of the reflective structure.

Career Highlights

Sarwat Amreen Baig is currently employed at Hewlett-Packard Development Company, L.P., where he continues to push the boundaries of innovation in reflective materials. His work at HP has allowed him to collaborate with other talented professionals in the field, contributing to the advancement of technology.

Collaborations

Some of Baig's notable coworkers include Mario Ariosto Matranga and Stephen Christopher Kitson. Their collaborative efforts have further enriched the innovative environment at Hewlett-Packard.

Conclusion

Sarwat Amreen Baig's contributions to the field of reflective materials through his patents demonstrate his commitment to innovation and technology. His work not only enhances the functionality of materials but also paves the way for future

Profile summary based on public USPTO records.
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