Suwon, South Korea

Sarah Kim

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sarah Kim. Retrieved from https://idiyas.com/inventor/sarah-kim-5n20895r

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Sarah Kim

Introduction

Sarah Kim is a prominent inventor based in Suwon-si, South Korea. She has made significant strides in the field of optical signal processing. Her work has led to the development of a unique inspection method that enhances substrate processing.

Latest Patents

Sarah Kim holds one patent titled "Inspection method, substrate processing method including the same, and substrate processing device using the substrate processing method." This innovative inspection method involves extracting a first similarity by comparing first data of a first optical signal with reference data of a reference optical signal. It also includes generating a first normal distribution of the first similarity and comparing it with a second normal distribution derived from a second optical signal. This method is crucial for improving the accuracy and efficiency of substrate processing.

Career Highlights

Sarah Kim is currently employed at Samsung Electronics Co., Ltd., where she continues to push the boundaries of technology. Her contributions to the field have been recognized for their potential to revolutionize optical signal processing.

Collaborations

Sarah collaborates with her coworker, Changyul Kim, to further enhance their research and development efforts. Their teamwork exemplifies the importance of collaboration in driving innovation.

Conclusion

Sarah Kim's innovative work in optical signal processing showcases her dedication to advancing technology. Her patent reflects her expertise and commitment to improving substrate processing methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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