Munich, Germany

Sarah Bagehorn

This inventor holds 1 USPTO granted patent and 1 published patent application and 3 EPO patents. Top assignee: Airbus Defence and Space Gmbh. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sarah Bagehorn. Retrieved from https://idiyas.com/inventor/sarah-bagehorn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Sarah Bagehorn: Innovator in Electrolytic Polishing

Introduction

Sarah Bagehorn is a notable inventor based in Munich, Germany. She has made significant contributions to the field of electrolytic polishing, showcasing her expertise through her innovative patent.

Latest Patents

Sarah Bagehorn holds a patent for a "Process for the electrolytic polishing of a metallic substrate." This patent outlines a method that includes several steps: providing an electrolyte in an electrolytic cell with at least one electrode, disposing a metallic substrate as an anode, applying a current at a voltage of 270 to 315 V from a power source, and immersing the metallic substrate in the electrolyte. The electrolyte consists of at least one acid compound, at least one fluoride compound, and at least one complexing agent.

Career Highlights

Throughout her career, Sarah has worked with prominent companies such as Airbus Defence and Space GmbH and Airbus Operations GmbH. Her experience in these organizations has allowed her to develop her skills and contribute to significant advancements in her field.

Collaborations

Some of her notable coworkers include Tobias Mertens and Elmar Bonaccurso. Their collaboration has likely fostered an environment of innovation and creativity in their projects.

Conclusion

Sarah Bagehorn is a pioneering inventor whose work in electrolytic polishing has made a lasting impact in the industry. Her patent and career achievements reflect her dedication to innovation and excellence.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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