Location History:
- Narita, JP (2010)
- Tokyo, JP (2013 - 2018)
Company Filing History:
Years Active: 2010-2018
Title: Saori Takeda: Innovator in Dielectric Materials
Introduction
Saori Takeda is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of dielectric materials, holding a total of 9 patents. Her work focuses on developing advanced dielectric films and elements that have applications in various electronic devices.
Latest Patents
One of her latest patents involves a dielectric film and dielectric element, which relates to a thin-film capacitor. This invention includes a dielectric film that contains a main component represented by the general formula (BaCa)(TiZr)O, with specific ranges for the variables x, y, and z. The dielectric film is designed with layers containing both columnar and spherical crystal grains, incorporating divalent and trivalent metal elements as sub-components. Another notable patent is for a thin-film dielectric that boasts a higher dielectric constant than conventional options. This invention does not require a special single crystal substrate and enables the production of large-capacity thin-film capacitor elements.
Career Highlights
Saori Takeda is currently employed at TDK Corporation, where she continues to innovate in the field of dielectric materials. Her work has been instrumental in advancing the technology behind thin-film capacitors, which are crucial for modern electronic applications.
Collaborations
Throughout her career, Saori has collaborated with notable colleagues, including Toshihiko Kaneko and Masakazu Hosono. These collaborations have further enhanced her research and development efforts in dielectric materials.
Conclusion
Saori Takeda is a trailblazer in the field of dielectric materials, with a strong portfolio of patents that reflect her innovative spirit. Her contributions are paving the way for advancements in electronic components, showcasing her impact on the industry.