Ebina, Japan

Saori Nishizaki

USPTO Granted Patents = 2 

Average Co-Inventor Count = 7.5

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Kanagawa, JP (2017)
  • Ebina, JP (2018)

Company Filing History:


Years Active: 2017-2018

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2 patents (USPTO):Explore Patents

Title: Saori Nishizaki: Innovator in Optical Measurement and Semiconductor Manufacturing

Introduction

Saori Nishizaki is a prominent inventor based in Ebina, Japan. She has made significant contributions to the fields of optical measurement and semiconductor manufacturing. With a total of two patents to her name, her work reflects a commitment to advancing technology and improving measurement techniques.

Latest Patents

Nishizaki's latest patents include an optical measurement apparatus and a light irradiation/reception method. This innovative apparatus features an emission section that emits light across the anterior chamber of an eyeball, a light reception section that captures the emitted light, and a positioning section that ensures accurate placement of the emission and reception components. Her second patent pertains to a semiconductor manufacturing device and method for producing semiconductor chips. This device includes an expanding unit for a holding member with an adhesive layer, a detection unit for assessing the adhesive state of semiconductor chips, and a pickup unit that adjusts its operation based on the detected adhesive state.

Career Highlights

Nishizaki is currently employed at Fuji Xerox Co., Ltd., where she continues to develop her innovative ideas. Her work has garnered attention for its practical applications in both optical and semiconductor technologies.

Collaborations

Some of her notable coworkers include Taku Kinoshita and Kazutaka Takeda, who contribute to her projects and enhance the collaborative environment at Fuji Xerox.

Conclusion

Saori Nishizaki stands out as a talented inventor whose work in optical measurement and semiconductor manufacturing is paving the way for future innovations. Her contributions are vital to the advancement of technology in these fields.

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