Yongin-si, South Korea

Sangwoo Jo

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Display Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sangwoo Jo. Retrieved from https://idiyas.com/inventor/sangwoo-jo-b6cbmhcx

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Sangwoo Jo

Introduction

Sangwoo Jo is a notable inventor based in Yongin-si, South Korea. He has made significant contributions to the field of technology, particularly in the development of mask assemblies. His innovative approach has led to the creation of a unique patent that addresses specific needs in the industry.

Latest Patents

Sangwoo Jo holds a patent for a "Mask assembly and method of manufacturing the mask assembly." This invention features a mask frame with an opening area and a mask sheet that overlaps this area. The mask sheet consists of a first area with a half-etched opening pattern and a second area with a penetrating pattern. The distinct designs of these patterns set his invention apart in the market.

Career Highlights

Sangwoo Jo is currently employed at Samsung Display Co., Ltd., where he continues to push the boundaries of innovation. His work at this leading company has allowed him to collaborate with other talented professionals in the field.

Collaborations

Some of his coworkers include Seoyeon Kim and Mina Woo, who contribute to the dynamic environment at Samsung Display Co., Ltd. Their collective efforts enhance the innovative projects they undertake.

Conclusion

Sangwoo Jo's contributions to the field of technology through his patent and work at Samsung Display Co., Ltd. highlight his role as a significant inventor. His innovative spirit continues to inspire advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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