This inventor holds 1 USPTO granted patent and 4 published patent applications and 1 EPO patent. Top assignee: Semes Co., Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Sangmin Ha - Innovator in Magnetic Flux Density Measurement
Introduction
Sangmin Ha is a notable inventor based in Hwaseong, South Korea. He has made significant contributions to the field of measurement technology, particularly in the area of magnetic flux density measurement. His innovative approach has led to the development of a unique measuring apparatus that enhances accuracy in process chambers.
Latest Patents
Sangmin Ha holds a patent for a "Wafer type measuring apparatus and magnetic flux density measuring method using the same." This invention provides a wafer-type measuring apparatus capable of accurately measuring the magnetic flux density in a process chamber without the need to open the chamber. The apparatus includes a wafer-type substrate, magnetic flux density sensors, a power supply, a microcontroller unit (MCU), and a wireless communication module. This design allows for efficient measurement of magnetic flux density in a process chamber using a magnetic field.
Career Highlights
Throughout his career, Sangmin Ha has worked with prominent companies such as Semes Co., Ltd. and Samsung SDI Co., Inc. His experience in these organizations has contributed to his expertise in measurement technologies and innovation.
Collaborations
Sangmin Ha has collaborated with talented individuals in his field, including Sujin Chae and Dongok Ahn. These collaborations have likely fostered a creative environment that encourages the development of cutting-edge technologies.
Conclusion
Sangmin Ha's contributions to the field of magnetic flux density measurement exemplify the spirit of innovation. His patented technology not only enhances measurement accuracy but also reflects his dedication to advancing measurement techniques in industrial applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile