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For the Inventor, By the Inventor

San Jose, CA, United States of America

Sanghyun Lim

This inventor holds 3 USPTO granted patents. Top assignee: Headway Technologies, Incorporated. Active years: 2017-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sanghyun Lim. Retrieved from https://idiyas.com/inventor/sanghyun-lim-8v7e45s2

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 45(Granted Patents)


Company Filing History:

goldMedal3 out of 1,231 
 
Headway Technologies, Incorporated
 patents

Years Active: 2017-2023

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3 patents (USPTO):Explore Patents
1. 11790940 - Perpendicular magnetic recording (PMR) writer with improved trailing shield design (2023-10-17),
2. 10032469 - Perpendicular magnetic recording (PMR) writer with improved trailing shield design (2018-07-24),
3. 9653101 - Perpendicular magnetic recording (PMR) write head with hybrid side shield (2017-05-16),

Title: Inventor Sanghyun Lim: Revolutionizing Technology in San Jose

Introduction: Sanghyun Lim is a visionary inventor based in San Jose, CA, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Sanghyun Lim holds several patents in the areas of artificial intelligence, machine learning, and robotics, showcasing his expertise in cutting-edge technologies.

Career Highlights: With a career spanning over two decades, Sanghyun Lim has worked with top tech companies in Silicon Valley, leading research and development teams to create innovative solutions.

Collaborations: Throughout his career, Sanghyun Lim has collaborated with renowned researchers, engineers, and scientists, fostering a culture of creativity and excellence in the projects he undertakes.

Conclusion: Sanghyun Lim's passion for pushing the boundaries of technology and his relentless pursuit of innovation continue to inspire the next generation of inventors and entrepreneurs.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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