Sanghyuk Choi

Title: Sanghyuk Choi: Innovator in Etching Technology

Introduction

Sanghyuk Choi is a notable inventor based in Palo Alto, CA, specializing in advanced etching technologies. He has made significant contributions to the field, particularly through his innovative patent that enhances the efficiency of etching processes in semiconductor manufacturing.

Latest Patents

Sanghyuk Choi holds a patent titled "Bias voltage modulation approach for SiO/SiN layer alternating etch process." This patent describes a method for etching a film stack with high selectivity and low etch recipe transition periods. The method involves transferring a substrate with a film stack into a processing chamber, applying a first bias voltage to the substrate, and etching an oxide layer. Subsequently, a second bias voltage, greater than the first, is applied to etch a nitride layer of the film stack.

Career Highlights

Sanghyuk Choi is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work focuses on developing innovative solutions that improve manufacturing processes and product quality.

Collaborations

Sanghyuk collaborates with talented professionals in his field, including Sean S Kang and Olivier Luere. These collaborations enhance the development of cutting-edge technologies in semiconductor manufacturing.

Conclusion

Sanghyuk Choi's contributions to etching technology through his innovative patent demonstrate his expertise and commitment to advancing the semiconductor industry. His work at Applied Materials, Inc. continues to influence the field positively.