This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: L'air Liquide,societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude. Active years: 2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025
Title: Innovations of Sanghoon Kim in Metal Oxide Thin Films
Introduction
Sanghoon Kim is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of electrochemistry, particularly in the development of processes for forming metal oxide thin films. His work focuses on enhancing the performance and longevity of electrodes in various applications.
Latest Patents
Sanghoon Kim holds a patent for "Processes for forming metal oxide thin films on electrode interphase control." This invention provides a novel solution to form an artificial interphase on the electrode to protect it from fast declining electrochemical behaviors. By depositing a Metal Oxides Layer using Atomic Layer Deposition (ALD) or Chemical Vapor Deposition (CVD), the invention addresses critical challenges in electrode performance. The metals discussed in this patent include IVA-VIA elements such as Titanium (Ti), Zirconium (Zr), Hafnium (Hf), Vanadium (V), Niobium (Nb), Tantalum (Ta), Chromium (Cr), Molybdenum (Mo), and Tungsten (W). The film needs to be thin, possibly discontinuous, and lithium-ion conductive enough to allow fast lithium-ion transfer at the interface between the electrode and electrolyte.
Career Highlights
Sanghoon Kim is currently employed at L'Air Liquide, Société Anonyme Pour L'étude Et L'exploitation Des Procédés Georges Claude. His role at this esteemed company allows him to further explore and develop innovative solutions in the field of materials science and electrochemistry.
Collaborations
Throughout his career, Sanghoon Kim has collaborated with notable professionals in his field, including Christian Dussarrat and Sunao Kamimura. These collaborations have contributed to the advancement of his research and the successful implementation of his inventions.
Conclusion
Sanghoon Kim's innovative work in metal oxide thin films represents a significant advancement in electrochemical technology. His contributions are poised to enhance the performance of electrodes, leading to improved efficiency in various applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile