Gwangjin-gu, South Korea

Sanghee Ra

This inventor holds 2 USPTO granted patents. Top assignee: Kimberly-Clark Worldwide, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sanghee Ra. Retrieved from https://idiyas.com/inventor/sanghee-ra-mpjbhy2a

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Sanghee Ra and Advances in Absorbent-Core Manufacturing.

Introduction

Sanghee Ra is an inventor based in Gwangjin-gu, South Korea. Her patent work includes a manufacturing approach for multilayer absorbent bodies, developed in connection with Kimberly-Clark Worldwide, Inc.

Latest Patents

Ra is associated with 1 patent, titled “Multi-layer absorbent cores and methods of manufacture.” The patent describes forming an absorbent body by combining first and second covering materials with a reinforcing material. Superabsorbent particles are applied to the reinforcing material, and the resulting laminate is embossed. The disclosed method aims to create a layered absorbent structure through a coordinated manufacturing process.

Career Highlights

Ra’s documented patent contribution focuses on absorbent-product materials and manufacturing. The invention addresses how reinforcing and covering layers can be assembled around absorbent material to form a multilayer body.

Collaborations

The patent information identifies Kimberly-Clark Worldwide, Inc. in connection with Ra’s work. Kueyoung You and MinJae Lee are listed as her coworkers.

Conclusion

Sanghee Ra’s patent work reflects an engineering contribution to multilayer absorbent structures and their manufacture, with a focus on combining materials into an embossed laminate.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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