Taejon, South Korea

Sang Won Kang

This inventor holds 3 USPTO granted patents. Top assignees: Genitech Co., Ltd., Other. Active years: 2001-2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sang Won Kang. Retrieved from https://idiyas.com/inventor/sang-won-kang-jz9reqgi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 3

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 2001-2002

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3 patents (USPTO):Explore Patents

Title: Innovations of Sang Won Kang

Introduction

Sang Won Kang is a notable inventor based in Taejon, South Korea. He has made significant contributions to the field of chemical vapor deposition and semiconductor technology. With a total of 3 patents, his work focuses on improving the efficiency and quality of various processes in these industries.

Latest Patents

One of his latest patents is a gas feeding system for chemical vapor deposition reactors and a method of controlling the same. This innovative system comprises multiple reactant source supply apparatuses that can supply different reactant sources to a reactor either discontinuously or sequentially. The design includes a pass valve that allows carrier gas to flow into the reactor or evacuation valve without passing through the reservoir when the inlet and outlet valves are closed. This feature helps prevent the waste of non-used reactant sources, thereby improving the uniformity and quality of the deposited film while reducing waste.

Another significant patent by Sang Won Kang is a method for forming a three-component nitride film containing metal, silicon, and nitrogen. This method is particularly useful for semiconductor devices. It involves preparing separate reactive gases, including a gaseous metal compound, a gaseous silicon compound, and ammonia gas, under specific conditions. The method ensures that these gases do not form a mixture before being applied to the substrate. By determining a sequential gas supply cycle, the method allows for the formation of a three-component nitride film with a uniform thickness, even on uneven semiconductor substrate surfaces.

Career Highlights

Sang Won Kang has worked with Genitech Co., Ltd., where he has applied his expertise in chemical vapor deposition and semiconductor technologies. His innovative approaches have contributed to advancements in these fields, showcasing his commitment to research and development.

Collaborations

Some of his notable coworkers include Kyu Hong Lee and Won Gu Kang. Their collaborative efforts have likely played a role in the successful development of various projects and patents.

Conclusion

Sang Won Kang's contributions to the field of chemical vapor deposition and semiconductor technology are noteworthy. His innovative patents reflect his dedication to improving processes and reducing waste in these industries. His work continues to influence advancements in technology and research.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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