Sang-Uhk Rhie

Title: Innovations by Sang-Uhk Rhie in Photolithography

Introduction

Sang-Uhk Rhie is a notable inventor based in Anyang, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in photolithography processes. His innovative work has led to advancements that enhance the efficiency and effectiveness of integrated circuit fabrication.

Latest Patents

One of Sang-Uhk Rhie's key patents is titled "Mask for a photolithography process and method of fabricating the same." This patent describes a mask and a method for fabricating the mask, which is used to optically transcribe patterns corresponding to integrated circuits on semiconductor substrates. The mask features a plurality of elements with at least one recessed corner defined by two edges. It includes proximity correcting auxiliary features that help maintain symmetry and reduce the number of auxiliary features required. This innovation ultimately leads to a reduction in the amount of data needed to represent the entire mask pattern, streamlining the photolithography process.

Career Highlights

Sang-Uhk Rhie is currently associated with Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to collaborate with other talented professionals in the field, further enhancing his contributions to semiconductor technology.

Collaborations

One of his notable coworkers is Ji-soong Park, with whom he has likely collaborated on various projects related to semiconductor innovations.

Conclusion

Sang-Uhk Rhie's contributions to photolithography and semiconductor technology exemplify the importance of innovation in advancing modern electronics. His patent work continues to influence the industry, showcasing the impact of dedicated inventors in shaping technological progress.