This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Se Plasma Inc.. Active years: 2002.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2002
Title: **Inventor Profile: Sang-Ro Lee**
Introduction
Sang-Ro Lee is a notable inventor based in Kyungsangnam-do, South Korea. With a focus on advancing plasma technology, he has made significant contributions to the field through his innovative inventions. One of his most prominent achievements is the development of an apparatus designed for generating low-temperature plasma at atmospheric pressure.
Latest Patents
Sang-Ro Lee holds a patent for an apparatus that generates low-temperature plasma at atmospheric pressure. This invention utilizes a configuration of electrodes with a specific thickness of dielectrics and includes a conductor electrode with a discharge gap. By applying an electric field through either pulse direct current or alternating current, while feeding a reaction gas between the electrodes, the device effectively induces various types of discharges, such as hollow cathode discharge and capillary discharge.
Career Highlights
Throughout his career, Sang-Ro Lee has made remarkable strides in the field of plasma generation technology. His work at Se Plasma Inc. has positioned him as a leader in this niche market, contributing to advancements that could open new applications across various industries. His innovative approach has not only secured a patent but also paves the way for future research and development in plasma applications.
Collaborations
In his endeavors at Se Plasma Inc., Sang-Ro Lee collaborates with esteemed colleagues, including Kee-Seok Nam and Jong-Ju Rha. Their combined expertise fosters a robust research environment, enabling the development of pioneering technologies in the field of plasma generation.
Conclusion
Sang-Ro Lee exemplifies the spirit of innovation within the scientific community. With a patent that reflects his ingenuity and dedication to his work, he continues to inspire future inventors and researchers in the pursuit of cutting-edge technologies in plasma applications. His contributions hold the promise of expanding the boundaries of what is possible in numerous industrial sectors.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile