Sang-mun Chun

Title: The Innovative Contributions of Sang-mun Chun

Introduction

Sang-mun Chun is a notable inventor based in Yongin, South Korea. He has made significant contributions to the field of photoresist technology, particularly in the semiconductor industry. With a total of 2 patents to his name, Chun's work has garnered attention for its innovative approaches to photoresist stripping methods.

Latest Patents

Chun's latest patents include a photoresist stripper composition and a method for stripping photoresist using the same. The photoresist stripper composition is formed of a mixture of acetone, γ-butyrolactone, and ester solvent. The method involves spraying the photoresist stripper composition over a substrate while rotating the substrate at a relatively low speed to effectively strip photoresist from the substrate. The rotation is then stopped for a short period, after which the composition is sprayed again while rotating the substrate at a relatively high speed. Finally, the substrate is rinsed with pure water to complete the process.

Career Highlights

Chun is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate and develop new technologies. His work has been instrumental in enhancing the efficiency and effectiveness of photoresist stripping processes, which are critical in semiconductor manufacturing.

Collaborations

Some of his notable coworkers include Sang-sik Moon and Mi-sook Jeon, who have collaborated with him on various projects within the company.

Conclusion

Sang-mun Chun's contributions to the field of photoresist technology exemplify the importance of innovation in the semiconductor industry. His patents reflect a commitment to advancing manufacturing processes and improving product quality.