Kyungsangbuk-do, South Korea

Sang-Ki Kwak


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 28(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Sang-Ki Kwak

Introduction

Sang-Ki Kwak, an accomplished inventor based in Kyungsangbuk-do, South Korea, has made significant strides in the field of materials science. With a focus on developing advanced materials, his work is rooted in innovation and practical application. He is affiliated with the Postech Foundation, where he collaborates with fellow researchers to push the boundaries of technology.

Latest Patents

One of Sang-Ki Kwak's notable contributions is his patent, titled "Method for preparing low dielectric films." This invention outlines a unique process for creating a low dielectric constant hydrogenated silicon-oxycarbide (SiCO:H) film. The method involves bringing an organosilicon or organosilicate compound, featuring at least one vinyl or ethynyl group, into contact with a substrate in the presence of an O-containing gas plasma. This innovative process has potential applications in the electronics industry, particularly in the production of advanced semiconductor devices.

Career Highlights

Sang-Ki Kwak's career is marked by his dedication to research and development in advanced materials. His patent reflects his expertise and creative approach to solving complex problems related to dielectric materials. Through his work, he contributes to important advancements that can enhance device performance and reliability.

Collaborations

In his professional journey, Sang-Ki Kwak collaborates closely with his coworker Shi-Woo Rhee. Together, they explore various avenues in material innovation, leveraging their combined knowledge and experience to advance their research projects at the Postech Foundation. This teamwork exemplifies the spirit of collaboration that is vital in the field of research and technology.

Conclusion

Sang-Ki Kwak stands out as a prominent inventor whose work is shaping the future of materials science. His patented method for preparing low dielectric films demonstrates his commitment to innovation and underscores the importance of collaboration in driving progress. As he continues his work at the Postech Foundation, his contributions will undoubtedly pave the way for new technologies and advancements in various industries.

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