Sang-jun Choi

Title: Innovations of Sang-jun Choi in Device Manufacturing

Introduction

Sang-jun Choi is a prominent inventor based in Santa Clara, CA, known for his significant contributions to device manufacturing technologies. With a total of 5 patents, he has made remarkable advancements in the field, particularly in etching processes and substrate processing.

Latest Patents

One of his latest patents is titled "High lateral to vertical ratio etch process for device manufacturing." This innovation involves etching a layer stack over a substrate using a photoresist pattern as a first mask. The photoresist pattern is cured in-situ using plasma, allowing for modifications to the pattern. The process also includes the formation of silicon by-products and the embedding of carbon from the plasma into the photoresist pattern. Additionally, ultraviolet light is utilized to cure the photoresist pattern, which is then slimmed for further etching. Another notable patent is "Device fabrication via pulsed plasma," which outlines systems and methods for processing substrates. This method includes a main etch operation followed by a phase shift sync pulsing (PSSP) operation, iteratively forming features to a predetermined depth.

Career Highlights

Sang-jun Choi is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work focuses on enhancing device manufacturing processes, contributing to the advancement of technology in various applications.

Collaborations

Throughout his career, Sang-jun has collaborated with notable colleagues, including Sang Wook Kim and Kyeong Tae Lee. These collaborations have fostered innovation and development in their respective fields.

Conclusion

Sang-jun Choi's contributions to device manufacturing through his innovative patents and collaborative efforts highlight his importance in the field. His work continues to influence advancements in technology and manufacturing processes.