Sang-joon Park

Title: Sang-joon Park: Innovator in Fine Patterning Technology

Introduction

Sang-joon Park is a notable inventor based in Seocho-gu, South Korea. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of fine patterning technology. His innovative methods have the potential to enhance the efficiency and precision of electronic component production.

Latest Patents

Sang-joon Park holds a patent for a "Method of forming fine patterns using double patterning process." This patent describes a double pattern method for creating multiple contact holes in a material layer on a substrate. The process involves forming a series of first hard mask patterns, followed by a self-aligned series of second hard mask patterns. These patterns are interleaved and separated by a buffer layer, resulting in composite mask patterns. The method further includes etching non-selected portions of the buffer layer to create hard mask holes, ultimately leading to the formation of contact holes in the material layer.

Career Highlights

Sang-joon Park is currently employed at Samsung Electronics Co., Ltd., a leading global technology company. His work at Samsung has positioned him at the forefront of innovation in semiconductor technology. With a focus on developing advanced manufacturing techniques, he continues to contribute to the evolution of electronic devices.

Collaborations

Sang-joon Park collaborates with talented colleagues, including Yong-Hyun Kwon and Jun Ho Seo. Their combined expertise fosters a creative environment that drives innovation and enhances the development of new technologies.

Conclusion

Sang-joon Park's contributions to fine patterning technology exemplify the importance of innovation in the semiconductor industry. His patented methods not only improve manufacturing processes but also pave the way for advancements in electronic components.