Sang-Il Han

Title: The Innovations of Sang-Il Han

Introduction

Sang-Il Han is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of semiconductor technology. His work has led to the development of innovative devices that enhance electronic performance.

Latest Patents

Sang-Il Han holds a patent for a semiconductor device. This device includes a substrate featuring a peripheral active pattern defined by a device isolation layer. It also incorporates a gate structure on the peripheral active pattern, along with a gate spacer that covers part of the side surface of the gate structure. The gate structure consists of an insulating pattern structure and a metal pattern structure. The insulating pattern structure includes a recess with a maximum depth in a first direction parallel to the top surface of the substrate at a specific height. Additionally, it features a first gate insulating pattern and a high-k dielectric layer, which are sequentially stacked on the substrate's top surface. The gate spacer includes a protrusion that is inserted into the recess.

Career Highlights

Sang-Il Han is currently employed at Samsung Electronics Ltd., a leading company in the electronics industry. His work at Samsung has allowed him to be at the forefront of semiconductor innovation.

Collaborations

He has collaborated with notable coworkers, including Sanggyu Ko and Hyuckchai Jung. Their teamwork has contributed to advancements in semiconductor technology.

Conclusion

Sang-Il Han's contributions to semiconductor devices exemplify the innovative spirit of modern technology. His patent reflects a commitment to enhancing electronic performance through advanced design.