Asan, South Korea

Sang-hoon Back

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Display Co., Ltd.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sang-hoon Back. Retrieved from https://idiyas.com/inventor/sang-hoon-back

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Sang-hoon Back: Innovator in Electronic Device Manufacturing

Introduction

Sang-hoon Back is a notable inventor based in Asan-si, South Korea. He has made significant contributions to the field of electronic device manufacturing. His innovative approach has led to the development of a unique method that enhances the efficiency of electronic device production.

Latest Patents

Sang-hoon Back holds 1 patent for his invention titled "Method of manufacturing electronic device." This patent outlines a method that includes providing a panel to a stage, aligning a circuit board with specific pad areas on the panel, and compressing portions of the circuit board to ensure proper connection. This method streamlines the manufacturing process and improves the reliability of electronic devices.

Career Highlights

Sang-hoon Back is currently employed at Samsung Display Co., Ltd., a leading company in the display technology sector. His work at Samsung has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in electronic device manufacturing.

Collaborations

Sang-hoon has collaborated with talented coworkers, including Jun-Hee Lee and Daeho Yang. Their combined expertise has fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Sang-hoon Back's contributions to the field of electronic device manufacturing exemplify the impact of innovation in technology. His patented method not only enhances production efficiency but also sets a standard for future developments in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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