Sang-heum Kim

Title: Sang-heum Kim: Innovator in Substrate Processing Technologies

Introduction

Sang-heum Kim is a notable inventor based in Mountain View, CA (US). He has made significant contributions to the field of substrate processing, particularly through his innovative methods and apparatus.

Latest Patents

Sang-heum Kim holds 1 patent for his work titled "Methods and apparatus for processing a substrate." This patent describes a method that involves depositing a silicide layer within a feature defined in a layer on a substrate. The process includes forming either a metal liner layer or a metal seed layer atop the silicide layer using physical vapor deposition techniques. Additionally, it details the deposition of molybdenum (Mo) or tungsten (W) without a vacuum break, utilizing chemical vapor deposition or atomic layer deposition.

Career Highlights

Sang-heum Kim is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work focuses on advancing technologies that enhance substrate processing efficiency and effectiveness.

Collaborations

Some of his notable coworkers include Annamalai Lakshmanan and Jacqueline S. Wrench, who contribute to the innovative environment at Applied Materials, Inc.

Conclusion

Sang-heum Kim's contributions to substrate processing technologies exemplify the impact of innovation in the semiconductor industry. His patent reflects a commitment to advancing manufacturing techniques that are crucial for modern technology.